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In a fruitful collaboration, Craig Hawker and his team at UC Santa Barbara (Hawker group) have been exploiting Solution Mask Liquid Lithography (SMaLL) based on two different photoswitchable molecular masks (for the original approach see: Adv. Mater. 2018, DOI: 10.1002/adma.201800364) to print two vastly different materials at two specific wavelengths. This approach greatly enhances the quality of the materials' interface and reduces its mechanical failure. The work will be published in a forthcoming issue of ACS Applied Materials & Interfaces.